Advanced micro-device engineering IV : selected peer reviewed papers from the 4th international conference on advanced micro-device engineering (AMDE 2012), December 7, 2012, Kiryu City Performing Arts Center, Kiryu, Japan / edited by Sumio Hosaka.

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Advanced Micro-Device Engineering IV; Table of Contents; I. Material Science; Estimation of Order Parameter and Spin Moment of Fe3Pt by White X-Ray Diffraction Method; Study of Perpendicular Magnetic Anisotropy in Co/Au Multilayer Probed by Magnetic Compton Profile; TEM Observation and Ionic Conductivity Study of Li2SiO3 Thin-Film on Sapphire Substrate; Electrical Properties of SnS Films Deposited by Thermal Evaporation of Sulfurized Sn Powder; Growth of La1-xBaxCoO3 Single Crystals and their Structural and Magnetic Properties.

Composition Dependence of the Glass Network Structure in Li+-ion Conducting Glasses of (LiCl)x(LiPO3)1-x Studied by 31P MAS NMRImprovement of Photovoltage in Dye-Sensitized Solar Cells with Azobenzene and Azulene Sensitizing Dyes by Applying Br3-/Br- Redox Mediator; II. Chemical Science and Technology; Nitrification of Nb-Modified Titanias Prepared by the Solvothermal Method and their Photocatalytic Activities under Visible-Light Irradiation; In Situ SAXS Analysis during Uniaxial Drawing of Polyethylene-block-Polystyrene Copolymer Film.

Tungsten Carbide Nanofiber Prepared by Electrospinning for Methanol Oxidation ReactionSintering of Copper Sub-Micron Particles by Heat and Atmospheric Pressure Non-Equilibrium Plasma Treatments; Functional-Group-Retaining Polymerization of Hydroxyethyl Methacrylate by Atmospheric Pressure Non-Equilibrium Plasma; III. Nano-Science and Technology; Fabrication of 6-nm-Sized Nanodot Arrays with 12 nm-Pitch along Guide Lines Using both Self-Assembling and Electron Beam-Drawing for 5 Tbit/in2 Magnetic Recording.

Ordering of Self-Assembled Nanodots Improved by Guide Pattern with Low Line Edge Roughness for 5 Tbit/in. 2 Patterned MediaFabrication of CoPt Nanodot Array with a Pitch of 33 nm Using Pattern-Transfer Technique of PS-PDMS Self-Assembly; Fabrication of Carbon Nanodot Arrays with a Pitch of 20 nm for Pattern-Transfer of PDMS Self-Assembled Nanodots; Fabrication of 25-nm-Pitched CoPt Magnetic Dot Arrays Using 30-keV-Electron Beam Drawing, RIE and Ion-Milling; Estimation of HSQ Resist Profile by Using High Contrast Developement Model for High Resolution EB Lithography.

Monte Carlo Simulation of Electron Trajectory in Solid for Electron Beam LithographyControlled Crystallization Process of Phase Change Memory Device by a Separate Heater Structure; Two Types of On-State Observed in the Operation of a Redox-Based Three-Terminal Device; Influence of Atmosphere on Photo-Assisted Atomic Switch Operations; Growth of Large Quantity ZnO Nanowires and their Optical Properties; IV. Photonics Device and Technology; Orthogonal Dual-Frequency SOA-Fiber Laser; Demonstration of Thermo-Optic Switch Consisting of Mach-Zehnder Polymer Waveguide Drawn Using Focused Proton Beam.

Collection of selected, peer reviewed papers from the 4th International Conference on Advanced Micro-Device Engineering (AMDE 2012), December 7, 2012, Kiryu City Performing Arts Center, Kiryu, Japan. The 39 papers are grouped as follows: Chapter 1: Material Science; Chapter 2: Chemical Science and Technology; Chapter 3: Nano-Science and Technology; Chapter 4: Photonics Device and Technology; Chapter 5: Novel Measurement and System Technology; Chapter 6: Information and Communication Engineering; Chapter 7: Medical Science and Engineering The 39 papers cover material science, chemical science a.

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